
@article {Cagomoc_2017,
	title = {RF plasma cleaning of silicon substrates with high-density polyethylene contamination},
	journal = {Japanese Journal of Applied Physics},
	volume = {57},
	number = {1S},
	year = {2017},
	month = {nov},
	pages = {01AB04},
	publisher = {Japan Society of Applied Physics},
	abstract = {Upon contact with a polymeric material, microparticles from the polymer may adhere to a silicon (Si) substrate during device processing. The adhesion contaminates the surface and, in turn, leads to defects in the fabricated Si-based microelectronic devices. In this study, Si substrates with artificially induced high-density polyethylene (HDPE) contamination was exposed to 13.56 MHz radio frequency (RF) plasma utilizing argon and oxygen gas admixtures at a power density of 5.6 W/cm2 and a working pressure of 110 Pa for up to 6 min of treatment. Optical microscopy studies revealed the removal of up to 74\% of the polymer contamination upon plasma exposure. Surface free energy (SFE) increased owing to the removal of contaminants as well as the formation of polar groups on the Si surface after plasma treatment. Atomic force microscopy scans showed a decrease in surface roughness from 12.25 nm for contaminated samples to 0.77 nm after plasma cleaning. The smoothening effect can be attributed to the removal of HDPE particles from the surface. In addition, scanning electron microscope images showed that there was a decrease in the amount of HDPE contaminants adhering onto the surface after plasma exposure.},
	doi = {10.7567/jjap.57.01ab04},
	url = {https://doi.org/10.7567\%2Fjjap.57.01ab04},
	author = {Charisse Marie D. Cagomoc and Mark Jeffry D. De Leon and Anna Sophia M. Ebuen and Marlo Nicole R. Gilos and Magdaleno R. Vasquez}
}
